Outcomes

the latest outcomes

Publications view all
our research
Scientific Data vol. 5, 180172 (2018)
The first annotated set of scanning electron microscopy images for nanoscience
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In this paper, we present the first publicly available human-annotated dataset of images obtained by the Scanning Electron Microscopy (SEM). A total of roughly 26,000 SEM images at the nanoscale are classified into 10 categories to form 4 labeled training sets, suited for image recognition tasks. The selected categories span the range of 0D objects such as particles, 1D nanowires and fibres, 2D films and coated surfaces as well as patterned surfaces, and 3D structures such as microelectromechanical system (MEMS) devices and pillars. Additional categories such as tips and biological are also included to expand the spectrum of possible images. A preliminary degree of hierarchy is introduced, by creating a subtree structure for the categories and populating them with the available images, wherever possible.
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our research
Microelectronic Engineering 195, 7 (2018)
Laser ablation and injection moulding as techniques for producing micro channels compatible with Small Angle X-Ray Scattering
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Microfluidic mixing is an important means for in-situ sample preparation and handling while Small Angle X-Ray Scattering (SAXS) is a proven tool for characterising (macro-)molecular structures. In combination those two techniques enable investigations of fast reactions with high time resolution (<1 ms). The goal of combining a micro mixer with SAXS, however, puts constraints on the materials and production methods used in the device fabrication. The measurement channel of the mixer needs good X-ray transparency and a low scattering background. While both depend on the material used, the requirement for low scattering especially limits the techniques suitable for producing the mixer, as the fabrication process can induce molecular orientations and stresses that can adversely influence the scattering signal.
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our research
Soft Matter 14, 6799 (2018)
Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurability
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Extreme ultraviolet interference lithography (EUV-IL) is used to manufacture topographical guiding patterns to direct the self-assembly of block copolymers. High-accuracy silicon oxide-like patterns with trenches ranging from 68 nm to 117 nm width are fabricated by exposing a hydrogen silsesquioxane (HSQ) resist layer using EUV-IL. We investigate how the accuracy, the low line width roughness and the low line edge roughness of the resulting patterns allow achieving DSA line/space patterns of a PS-b-PMMA (polystyrene-block-poly methyl methacrylate) block copolymer of 11 nm half-pitch with low defectivity. We conduct an in-depth study of the dependence of the DSA pattern morphology on the trench width and on how the neutral brush covers the guiding pattern. We identify the relation between trench width and the emergence of defects with nanometer precision. Based on these studies, we develop a model that extends available free energy models, which allows us to predict the patterning process window.
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Deliverables view all
WP7 - JRA2 - Research on High Precision Manufacturing
D7.15 - Realization of coplanar electrode arrays with 10 nm gaps
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There is growing interest in the study of the electrical properties of single nano-objects. This deliverable demonstrates the successful fabrication of arrays of nanogaps via exploiting the precision of growth processes for lateral patterning, as the nanogaps arrays could be used as a substrate to correlate the structural properties of nanomaterials immobilized between the gaps with their electrical properties. In particular, technologies for fabrication of metallic nanogaps down to 10 nm and nanogaps arrays, as well as arrays of individual nanogaps, have been developed. Also fabrication parameters have been optimized for minimising leakage currents and improving electrode characteristics. Current technology is now readilly available for the needs of NFFA users via the transnational access procedure.
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WP10 - JRA5 – Nano-Object Transfer and Positioning
D10.6 - Test experiment of transfer and positioning system to a soft X-ray microscopy setup
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This JRA5 deliverable report D10.6 “Test experiment of transfer and positioning system to a soft Xray microscopy setup” describes the status of the implementation of the transfer and positioning system to the soft X-ray microscopy setups at SOLEIL, France. All technical prerequisites have been developed, are readily available for use and are in particular as part already offered to NFFA transnational access users. In particular, both, the nano-transfer tool developed within JRA5, including the three columns i) the Matlab and Python implementation of the software script, ii) the “hierarchical marker design on demand” as well as iii) the electron- (EBID) and ion-(IBID) induced deposition, as well as the capabilities for a nano-transfer at the SOLEIL beamlines are all implemented and integrated. The goals of all three columns have been achieved, as separately documented in several JRA5 deliverable reports. The software-setup and the marker technology has been tested and approved, and are ready to use. At the soft X-ray beamlines at SOLEIL dedicated for the “Advanced Nano- Object Transfer and Positioning” the equipment and technical infrastructure ensures compatibility and easy implementation. In a test experiment to be scheduled at the time of the deadline, the full integration of the nanotransfer tool on one hand and the positioning devices at the SOLEIL beamline at the other hand will be shown. At the same time, the array markers created by direct-write non-linear lithography at FORTH will be utilised to permit a nano-transfer based on the re-location of selected nano-objects at a nano-science centre to a soft-X-ray beamline setup at an Analytical Large Scale Facility (ALSF). We in particular stress here that the compatibility between the modular transfer and positioning system and the hardware at the two dedicated SOLEIL parallel imaging X-ray photoemission electron microscope (XPEEM) and the scanning microscope (STXM) beamlines at SOLEIL has been achieved and the technical feasibility of D10.6 is assured.
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WP11 - NA – Innovation and networking activities
D11.15 - Third Annual report on NFFA-EUROPE dissemination activities
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The dissemination and awareness activities of NFFA-Europe heavily contributed to the success of the NFFA-Europe project. Its very positive impact to the TransNational Access programme, this is shown by the large number of proposals submitted for the use of the NFFA-Europe infrastructure. During the third year, the activities were not only kept at the same level of the previous years but were broadened, because the end of the project is still far away and there is atill enough time to approach new users for let them use the infrastructure available within the NFFA-Europe project. During the third year the NFFA-Europe project has been presented at 22 conferences; two dedicated NFFA-Europe events have been organized; two issues of the NFFA-Europe Newsletter have been published and distributed to a number of scientists; an advertisment page has been published reaching a huge number of scientists. The international collaborations to US and Australian similar projects are producing good results in terms of future collaborations. The NFFA-Europe dissemination programme is definitely in line with the expectations.
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Transnational Access Statistics
11 calls for access
355 proposals submitted
65% rate of acceptance
32% with Large Scale Facilities
13% with theory
10% with industry
~3 average users per proposal
43 countries applying
1023 lab sessions